Correction of optical elements by correction light irradiated in a flat manner

ABSTRACT

The disclosure relates to a correction light device for the irradiation of optical elements of an optical arrangement, in particular a lens, such a microlithography lens having a correction light, which include at least one correction light source and at least one mirror arrangement that deflects the light from the correction light source in the beam path to the optical element such that at least part of at least one surface of at least one optical element of the optical arrangement are irradiated in a locally and/or temporally variable fashion. The correction light strikes the surface of the optical element at a flat angle such that the obtuse angle between the optical axis of the optical arrangement at the location of the optical element and the correction light beam is less than or equal to 105°.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of, and claims benefit under 35 USC120 to, U.S. application Ser. No. 14/448,046, filed Jul. 31, 2014, whichis a continuation of, and claims priority under 35 USC 120 to, U.S.application Ser. No. 14/079,124, filed Nov. 13, 2013, now U.S. Pat. No.8,811,568, which is a continuation of, and claims priority under 35 USC120 to, U.S. application Ser. No. 12/565,481, filed Sep. 23, 2009, nowU.S. Pat. No. 8,760,744, which is a continuation of, and claims priorityunder 35 USC 120 to, international application PCT/EP2008/053577, filedMar. 26, 2008, which claims benefit of German Application No. 10 2007014 699.1, filed Mar. 27, 2007. Each of the foregiong applications arehereby incorporated by reference in their entirety.

FIELD

The disclosure relates to a method and a device for irradiation ofoptical elements of an optical arrangement, for example a lens, such asa microlithography lens, with correction light for changing the opticalproperties of the lens and a corresponding lens in which this is used.

BACKGROUND

In optical configurations, such as lenses for microlithography,especially projection exposure installations for microlithography,non-rotationally symmetrical illumination or a slit-shaped image fieldcan lead to inhomogeneous irradiation of optical elements, which in turncan lead to inhomogeneous heating of the corresponding optical element.The inhomogeneous heating can lead to corresponding distortions orstresses, which in turn can lead to changes in the optical properties ofthe optical element and to imaging errors.

SUMMARY

In some embodiments, the disclosure provides a device for irradiation ofoptical elements of an optical arrangement with correction light(correction light device), which avoids certain undesirabledisadvantages while facilitating lateral irradiation with correctionlight onto the optical element to be corrected, even at small distancesfrom the next optical element or part. At the same time, thecorresponding device can have a simple design and can be simple to use.

In certain embodiments, a device and an associated working method areprovided in which the irradiation of an optical element of an opticalarrangement with correction light proceeds via at least one mirrorarrangement, which deflects the correction light from a correction lightsource towards the optical element, such that at least parts of at leastone surface of at least one optical element of the optical arrangementcan be irradiated at a flat angle relative to the surface of the opticalelement in a locally and/or temporally variable fashion. The obtuseangle between the optical axis of the optical arrangement at the placeof the optical element and the correction light ray is less than orequal to 105° (e.g., less than or equal to 100°, less than or equal to95°), and the acute angle between the surface of the optical element andthe correction light beam is less than or equal to 15° (e.g., less thanor equal to 10°, less than or equal to 5°).

Such a flat irradiation angle can enable a corresponding correction ofthermal inhomogeneities of the optical element even at short distancesfrom the next part. In particular, a lateral, optionally spacedarrangement of the correction light device from the optical axis of theoptical arrangement is possible, such that no impairment of the opticalarrangement need be feared or such that easy interchangeability of thecorrection light device is possible.

The term correction light in this regard includes any electromagneticradiation, but especially infrared light with a wavelength greater thanor equal to 4 μm.

Flat irradiation with correction light onto the optical element to becorrected can be realized in two ways. First, realization via a scanningdevice is possible and, second, it is proposed that a two-dimensionalimage of a multi-mirror array (MMA) be used. From one aspect of thedisclosure, protection is also sought independently for the use of amulti-mirror array in a corresponding correction light device.

Beam divergence or convergence of the correction light beam can beminimised by choosing a correction light beam of low divergence ornumerical aperture, wherein the divergence of the laser beam used can becalculated from the formula for the half-width value (1/e³) w (z, w0) ata distance z from the beam waist

${w( {z,{w\; 0}} )}:={1.5\sqrt{( {w\; 0} )^{2}( {1 + ( \frac{\lambda \cdot z}{{\pi \cdot w}\; 0^{2}} )^{2}} )}}$

or by the formula (diffraction-limited point image)

$d = \frac{k \cdot \lambda}{2 \cdot {NA}}$

where w0 denotes the beam waist, z is the distance from the beam waist,λ is the wavelength, d is the waist diameter and K is a factor, whichtakes account of the radial intensity of the laser beam perpendicular tothe propagation direction for a Gaussian distribution of the radialintensity. NA denotes the numerical aperture. In general, neither of thetwo borderline cases will apply purely. This means, however, that alaser beam which is optimal in respect of divergence can be determinedfor a particular application case.

Regardless of the technical realization of the correction light device,some fundamental physical aspects arise from flat irradiation with thecorrection light:

-   -   a) The dependence of the size of the light spot generated on the        optical element to be corrected on the angle of incidence        (projection of the light bundle diameter onto the surface), and        the change in this size and in the degree of absorption at the        element to be corrected when the angle of incidence is varied.    -   b) The numerical aperture (NA) needed for the production of a        light spot    -   c) The depth of field associated with the numerical aperture        (NA) and the associated enlargement of the light spot when the        area of focus is exited.

These relationships are discussed below in more detail.

A multi-mirror array (MMA) can consist of a plurality of mirror elementswhich are arranged side-by-side and which can be swivelled separatelyfrom each other. The mirror elements can be arranged in rows and columnsin a field, with individual mirror elements capable of swivellingbetween one position in which correction light is directed onto theoptical element (correction light position) and a second position inwhich no correction light is directed onto the optical element. Thisdefines two digital states, in which correction light is either directedor not directed onto the optical element to be corrected via thecorresponding mirror element. Thus, since each mirror element of themulti-mirror array is assigned to a particular region of the surface ofthe optical element to be corrected, it is possible to effect a locallyvariable setting of the correction irradiation by controlling theposition of the individual mirror elements. At the same time, it ispossible to exert corresponding temporal control, too, by controllingthe timing of the correction light position of each mirror element.

Rapid switching of the mirror elements through switching and cycle timesin the region of <1 second, particularly <<1 second, can serve thepurpose of controlling the intensity, i.e. of determining the quantityof light applied to a specific area of the optical element, while slowchange switching or cycle times of >1 second can be used for the purposeof adaptation of the spatial distribution of the correction light. Therapid switching of the mirror elements can thus essentially be used, forexample, to determine the heating of the corresponding surface region bythe rapid succession of switching the correction light on and off, whilea superimposed slower switching of specific regions of the multi-mirrorarray contributes to corresponding differential heating of differentregions of the optical element.

The mirror elements, in order that full-face illumination or irradiationof the surface of the optical element to be irradiated may be maximized,should be provided as closely as possible to each other, i.e. at aminimum possible distance from each other. However, a consequence ofthis can be that the individual mirror elements influence each other insuch a way that, in the case of neighbouring mirror elements of whichone is in the correction light position, i.e. directs the correctionlight onto the optical element to be irradiated, and of which the otheris in the non-correction light position, shadowing occurs. This can becountered by choosing the swivelling position of the individual mirrorelements such that the small adjustment angle does not create mutualshadowing. Alternatively or in addition, a control can be provided thattakes account of the fact that neighbouring mirror elements may possiblyonly be allowed to partially swivel in order that correspondingshadowing effects may be avoided.

If the dimensions of the multi-mirror array (MMA) are chosenaccordingly, the correction light which is irradiated onto themulti-mirror array can be irradiated directly onto the surface of theoptical element to be irradiated.

Alternatively, it is also possible to provide a correction lightarrangement with which the image of the mirror arrangement can be imagedonto the optical element of the optical arrangement. This allows, forexample, different proportions of multi-mirror array on one hand and thesurface of the element to be irradiated on the other to be adjusted toeach other.

The correction light arrangement can include a diaphragm and two opticallenses, especially convex lenses, optionally as a double telecentricarrangement, which facilitates imaging of the field of the multi-mirrorarray onto the surface to be irradiated. Several optical lenses or lensgroups are conceivable, too. Particularly, the corresponding choice offocal lengths can allow the multi-mirror array to be provided at amarked distance away from the optical axis of the optical arrangement ofthe optical element to be irradiated, such that no undesirableinfluencing of the imaging properties of optical arrangement of themulti-mirror array need be feared.

For the irradiation of two, optionally opposing surfaces of neighbouringoptical elements of the optical arrangement, two mirror arrangements canbe provided in the form of multi-mirror arrays with their backs to eachother. Obviously, it is also possible to combine several correctionlight devices with several correction light sources for the purpose ofcorrecting various optical elements.

To prevent neighbouring mirror elements of the mirror arrangement of amulti-mirror array from causing mutual shadowing effects, a diffractiongrating can be provided between the multi-mirror array and the opticalelement to be irradiated or a correction light arrangement for thepurpose of imaging the field of the multi-mirror array onto the opticalelement. The diffraction grating ensures that, at large angles,especially perpendicular from the multi-mirror array, reflectedcorrection light, which is therefore not subject to shadowing effects,is diffracted such that it is at a flat angle when it strikes theoptical element to be irradiated. Accordingly, light of the first or ahigher diffraction order is used as correction light.

In some embodiments, the diffraction grating can be provided both in thebeam path between the correction light source and the multi-mirror arrayand between the multi-mirror array and the optical element to beirradiated or a correction light arrangement for the purpose of imagingthe field of the multi-mirror array onto the optical element. This isparticularly advantageous if the grating used allows light of onepolarization direction to pass largely unimpeded and diffracts light ofthe orthogonal polarization direction largely completely at a largeangle. Such a grating with a period in the magnitude of the wavelengthis feasible with high efficiency in the preferred wavelength range.

For example, if light which is linearly polarized in one direction and alarge percentage of which is transmitted through the polarizing gratingin the zeroth diffraction order, the result is a high yield for theirradiation of the multi-mirror array. If the grating is followed by aquarter-wave plate (λ/4 plate) whose optical axis is rotated by 45°against the direction of light polarization, the quarter-wave plategenerates circularly polarized light, which strikes the multi-mirrorarray.

After reflection of the correction light by the mirrors of themulti-mirror array, the circularly polarized light, on passing onceagain through the quarter-wave plate, is polarized to a linearlypolarized light with polarization direction rotated at 90° to the firstpolarization direction, with the light which was diffracted by thediffraction grating into the first or higher diffraction order servingas correction light. The yield of the light diffracted into the first orhigher diffraction order can be optimized by the changed polarizationdirection.

The correction light source can be an anamorphic light beam and inparticular a laser beam, whereby the numerical aperture of thecorrection light beam in a plane parallel to the irradiation directiononto the multi-mirror array and perpendicular to the multi-mirror arrayis kept small, while a greater numerical aperture is permissible in adirection perpendicular thereto. This stems from the flat irradiationangle onto the multi-mirror array or the optical element, as a result ofwhich the beam cross-section in one direction is greatly expanded,whereas no distortion occurs in the vertical direction thereto.Similarly, a larger numerical aperture can also be allowed in thedirection in which no distortion occurs.

The functioning of the correction light device using a multi-mirrorarray (MMA) with a plurality of individually controllable or swivellablemirror elements is as follows:

The correction light source irradiates the full surface of the field ofthe multiple mirror array having the plurality of mirror elements, withthe mirror elements capable of being in the correction light position inwhich the incident correction light is deflected by deflection onto thesurface of the optical element to be irradiated. Now, if locallydifferentiated irradiation or corrections are made, individual, severalor, in an extreme case, all mirror elements can be transferred from thecorrection light position into the second, non-correction light positionin which the correction light no longer strikes the surface of theoptical element to be irradiated. This can also be used not only toeffect local differentiation, but also to control the energy or powerconsumption of the optical element and thus heating. Similarly, givenadequate irradiation of a specific region of the surface of the opticalelement, the mirror elements can be transferred into the non-correctionlight position, while, in the event of heating, the mirror elements canbe correspondingly transferred into the correction light position.

To ensure high uniformity of illumination by the correction light, ahomogenizing element can be provided. In particular, candidates forthese are crystal rods, known as light boxes or hollow rod integrators(Hohlstabsintegratoren), which effect homogenization, through multiplereflection, of the light striking the MMA.

In accordance with a further possible solution for realizing acorrection light device, the mirror array can be formed as a firstscanning device, with the mirror array including one or more mirrorsurfaces which are rotated or swivelled in an oscillating manner ordisplaced such that the correction light beam moves over the opticalelement line by line along a scanning direction.

Where several mirror surfaces are provided, they can be arrangedadjacent to each other in polygon fashion, such that, as a result of arotation of the mirror array about an axis parallel to the mirrorsurfaces, the individual mirror surfaces can successively interact withthe correction light beam.

Besides this first scanning device, in which at least one mirrorsurface, optionally several mirror surfaces, are rotated, swivelled ordisplaced, to effect in a first scanning device irradiation of differentregions of the surface to be irradiated, a second scanning device canadditionally be provided, which facilitates a movement of the correctionlight beam in a second scanning direction, optionally perpendicularly tothe movement of the first scanning direction.

Through corresponding superimposition of the movements of the first andsecond scanning device, line-by-line rasterizing of the surface of theoptical element can occur, such that all areas of the surface of theoptical element to be irradiated are covered by the correction lightbeam in a temporal sequence.

As two different scanning devices are provided for the differentscanning or rasterizing of the surface of the optical element indifferent directions, an anamorphic correction light beam which differsin the principal directions may be used. In particular, the numericalaperture in the plane of the first, especially the faster scanningdirection can be smaller than in the plane perpendicular thereto, sincethe size of focused light spot transverse to the faster scanningdirection is greatly increased by the flat angle of incidence.Accordingly, the diffraction spot in the faster scanning direction canbe chosen to be larger.

Through the corresponding shape of the correction light beam, a polygonarrangement with several mirrors arranged side by side at an angle toeach other, for example, can be used as a scanning device, such that themirror elements have a rectangular shape with very short sides on onehand and very long sides on the other. The outcome is a polygon mirrorwhich is cylinder-like and whose main surface has a plurality of narrow,but high mirrors, such that the cylinder radius can be chosen to besmall. This in turn allows high rotation speeds and thus scanning speedssince the centrifugal forces are smaller and thus more easily manageabledue to the small radius.

Through corresponding control of the correction light such that theproperties of the correction light are changed as a function of time,for example, the light intensity or the light power, the desiredtemporal and/or locally variable irradiation of the surface can beperformed at the corresponding points of incidence of the correctionlight beam on the surface of the optical element.

Due to non-parallel shaping of the correction light beam bundle,different angles of incidence on the surface of the optical element tobe irradiated can lead to changes in the incident beam cross-section,such that defined correction of inhomogeneous heating of the opticalelement by the correction light bean is impeded.

Accordingly, the correction light device can be configured, such thatcompensation of the impact cross-section is provided, i.e. care is takento ensure that the beam cross-section of the correction light beamincident on the surface of the optical element to be irradiated isapproximately constant over the entire scanned region.

Due to the numerical aperture of the correction light beam, enlargementof the incident light spot may occur during defocusing, too. In a tiltedobject, different distances in the correction light device can bringabout defocusing.

Constant maintenance of the cross-sectional size of the correction lightbeam incident on the surface of the optical element to be irradiated canbe achieved by providing focus tracking, which either is providedseparately in the light beam of the correction light or can beintegrated into the second scanning device. Separate focus tracking canbe realized by providing a lens group, for example, including two convexlenses, of which one can be displaced by translation along the opticalaxis of the correction light beam.

Alternatively, the focus tracking can be integrated into the secondscanning device, if this has a mirror capable of translation, such thatfocus tracking is formed correspondingly by this module, or isdispensable due to the design of this module.

The separate focus tracking can be provided in the correction light beamin front of the mirror array, i.e. the first scanning device. Alsoadvantageous is an arrangement of the focus tracking in the region of anintermediate focus in the correction light beam path.

For the purpose of defined irradiation of the surface of the opticalelement, an optical correction light arrangement including at least oneor more optical elements such as lenses, lens groups, mirrors,diffractive or refractive optical elements can be provided in the beampath of the correction light, with in particular a corresponding opticalcorrection light arrangement capable of being provided between themirror array, i.e. the first scanning device and the second scanningdevice.

Optionally, by the use of the optical correction light arrangement, thecorrection light beam is focused with a large focal length orcross-sectional width (focal intercept) onto the surface of the opticalelement of the optical arrangement in order that the correction lightdevice may be provided at a distance from the optical axis of theoptical arrangement of the optical element to be irradiated. In thisway, a negative influence exerted by the correction light device on theoptical arrangement may be reduced or largely ruled out. By way of focallength or cross-sectional width (focal intercept), the values chosen canbe in the range ≧200 mm (e.g., ≧400 mm, greater than or equal to 600mm).

For the purpose of being able to correct thermal inhomogeneities of theoptical element by correction light, especially infrared light, in thecase of the correction light device with scanning device, theirradiation is varied in accordance with the point of incidence of thecorrection light on the surface to be irradiated. To this end, aregulator, especially an output regulator, can be provided for thecorrection light, the output regulator interacting with the mirrorarray, i.e. the first scanning device and/or the second scanning device,such that the correction light is variably adjusted as a function of thelocation of the correction light beam on the surface of the opticalelement.

To this end, an acoustic-optic modulator (AOM) can be provided, whichfunctions as a switch or regulator for the correction light.

In connection with a sensor device, which determines the irradiation ofthe optical element and/or the temperature inhomogeneities, automaticcontrol of the acoustic-optic modulator can be provided.

Overall, an automatic open-loop control and/or closed-loop controldevice can be provide, which provides open-loop and/or closed-loopcontrol over the working parameters of the correction light device by asensor device.

BRIEF DESCRIPTION OF THE FIGURES

Further advantages, characteristics and features of the disclosure areapparent from the following detailed description and the drawings, inwhich:

FIG. 1 is a schematic arrangement of a correction light device with amulti-mirror array (MMA);

FIG. 2 shows a correction light device;

FIG. 3 is a plan view of a multi-mirror array, as used in the devices ofFIGS. 1 and 2;

FIG. 4 is a side view of the multi-mirror array from FIG. 3;

FIG. 5 shows a correction light device;

FIG. 6 shows a correction light device;

FIG. 7 is a detailed view of a part of the correction light device fromFIG. 6;

FIG. 8 shows a correction light device;

FIG. 9 is a 90°-rotated view of the correction light device from FIG. 8;

FIG. 10 is an illustration of a lens in which a correction light devicescan be used; and

FIG. 11 is a diagram that explains the relationship between the angle ofincidence of the correction light, its numerical aperture and the lightspot size.

DETAILED DESCRIPTION

FIG. 1 shows a schematic side view of a first exemplary embodiment of acorrection light device, in which, from a correction light source notshown, a correction light beam 1 in the form of infrared light strikes amulti-mirror array 2 (MMA) at an angle such that the correction lightbeam 1 is deflected at the mirror elements of the multi-mirror array 2.

Provided that mirror elements are arranged in a first position relativeto the incident correction light beam 1, they are imaged via thedownstream correction light arrangement consisting of two lenses 3 and 5and the diaphragm 4 onto the surface 9 of the optical element 6, suchthat the striking of the infrared radiation on the optical element 6gives rise to corresponding heating. The optical element 6 can beprovided in an optical arrangement of a microlithography lens (notshown).

If individual mirror elements of the multi-mirror array 2 are not in thefirst position, in which the incident correction light 1 is imaged ontothe surface 9 of the optical element 6, but rather in a second positionsuch that the incident correction light 1 is deflected such that it isnot imaged onto the surface 9 of the optical element 6 by the opticalcorrection light arrangement, then, the corresponding regions of thesurface 9 of the optical element 6, which are assigned to those mirrorelements of the multi-mirror array 2 which are in the second position,do not undergo heating by the correction light 1. That correction light1 which is blocked out from the correction light beam by the mirrorelements of the multi-mirror array in the second position can, forexample, be intercepted by diaphragm 4 or other diaphragm arrangements.

In such a correction light device, it is possible, through controllingthe mirror elements of the multi-mirror array, to change the locationand timing of irradiation of the optical element 6 with correctionlight, and thereby, for example, through the use of infrared light, toeffect correction heating of the optical element 6 for a certain periodof time in those areas in which the optical element 6 is unevenly heatedby, for example, non-uniform irradiation with imaging light of theoptical arrangement of optical element 6.

Similarly, a sensor device (not shown) can be provided, by whosemeasurements the multi-mirror array can be automatically regulated suchthat detected inhomogeneities relating to heating of the optical element6 are automatically compensated.

Whereas FIG. 1 shows a correction light device for irradiation of thesurface 9 of the optical element 6, FIG. 2 shows a correction lightdevice in which two multi-mirror arrays 2 and 12 are arranged back toback such that two correction light beams 1 and 11 from two correctionlight sources, not shown, are directed via a corresponding opticalcorrection light arrangement onto two surfaces 9 and 10 from twodifferent optical elements 6 and 8 of an optical arrangement, such as amicrolithography lens.

Since the same components are partially used in FIG. 2 as in the deviceof FIG. 1, these are provided with the same reference symbols, such thatan additional description of these components is unnecessary. Whatfollows therefore concerns only the differences from the exemplaryembodiment of FIG. 1.

As can be seen in FIG. 2, instead of a diaphragm 4 with one transmissionopening as in the exemplary embodiment of FIG. 1, a diaphragm 7 with twotransmission openings 13 and 14 is used to transmit the two correctionlight beams 1 and 11, which strike the mirror elements in the firstposition, i.e., the irradiation position.

To keep the dimensions of the optical elements, such as lenses 3 and 5,and the diaphragm 7 of the optical correction light arrangement small,it is possible for the multi-mirror array to be arranged with theminimum possible distance between their backs. This distance can only 10mm or less, such as 5 mm or less.

However, it is also possible and conceivable for the multi-mirror arraysto be arranged separately from each other in conjugated planes andthereby for the space constrictions to be minimized.

Via the correction light devices of FIGS. 1 and 2, the multi-mirrorarrays are used to effect simultaneous, full-face irradiation of thesurfaces 9 and 10 of the optical elements 6 and 8, whereby, throughcorresponding tilting of individual mirror elements, individual or allregions of the irradiation surface can be provided with correction lightor not. With that, local variation of the irradiation is feasible. Inaddition, the duration of irradiation can also be set by switching themirror elements correspondingly. With that, temporal variability isfeasible. Moreover, the correction light sources used can be variedaccording to their on-duration, power, etc.

As FIGS. 1 and 2 further show, the exemplary embodiments shown arecapable of laterally irradiating optical elements 6 and 8 in an opticalarrangement at a very shallow irradiation angle.

FIGS. 3 and 4 show the multi-mirror array 2 in a plan view and a sideview. The multi-mirror array including five rows and five columns has atotal of 25 mirror elements 15 which, in the case of the fourth row, forexample, can be swivelled about an axis of rotation 16 in line with thearrow 17, such that they can be swivelled between a first positionwhich, for example, is aligned horizontally, and a second position inwhich the mirror surface of the mirror elements 15 is oriented at anangle a to the horizontal. The horizontal first position can be theirradiation or correction light position in which incident correctionlight, for example infrared light, strikes the surface of the opticalelement to be irradiated, while the second position inclined towards thehorizontal is the position in which the incident correction light is notdirected onto the surface of the optical element 6 and 8 to beirradiated.

The angle α should be as small as possible in order that shadowingeffects of neighbouring mirror elements 15 may be avoided. At the sametime, the distance between the individual mirror elements 15 should alsobe kept as small as possible in order that maximum-possible full-faceirradiation of the optical elements 6 and 8 may be guaranteed.

FIG. 6 shows in an illustration similar to FIGS. 1 and 2 a thirdexemplary embodiment of a correction light device, which largelycorresponds to those from FIG. 1. Accordingly, the same components haveidentical reference symbols, and a repeated description of thesecomponents is unnecessary. In the following, consequently only theadditional components present and the differences between the exemplaryembodiments of FIG. 6 and FIG. 1 are discussed.

In the correction light device, a polarizing diffraction grating 101 anda λ/4 plate 102 are provided in the beam path between the multi-mirrorarray 2 (MMA) and the correction light source (not shown). At the sametime, the polarizing diffraction grating 101 and the quarter-wave plate102 are also in the beam path from the multi-mirror array 2 to theoptical element 6, with the correction light additionally passingthrough the optical correction arrangement consisting of the lenses 3and 5, and the diaphragm 4.

In the exemplary embodiment shown in FIG. 6, linearly polarized light ofpolarization direction s is used, for which the diffraction grating 101in the zeroth diffraction order has a very large transmissionefficiency.

Via the quarter-wave plate (λ/4-plate) 102 provided after thediffraction grating 101, the linearly polarized light is converted intocircularly polarized light. After the circularly polarized correctionlight strikes the mirror elements of the multi-mirror array 2 and isreflected, the circularly polarized light is converted by quarter-waveplate 102 back into linearly polarized light with a second polarizationdirection p perpendicular to s, with this polarization direction pfacilitating a high light yield in the first diffraction order of thediffraction grating 101. The first diffraction order of the diffractiongrating 101 is located for example at an angle of 70° to the angle ofincidence, such that now, instead of correction light which originallywas almost perpendicular to the multi-mirror array, a correction lightwhich is radiating flat relative to the multi-mirror array and theoptical axis is fed into the optical correction arrangement 3, 4, 5where it too is irradiated at a flat angle onto the optical element 6.

Through the use of the diffraction grating, the correction light canthus be projected onto the multi-mirror array at relatively large anglesand be reflected from this, such that shadowing effects due toneighbouring mirror elements need not be feared. Through subsequent useof the light of the first or higher diffraction order of the diffractiongrating, the correction light is projected correspondingly flat onto theoptical element, however. The use of polarized light in conjunction withthe quarter-wave plate 102 makes for optimal usage of the correctionlight. Were a non-polarizing diffraction grating only to be used, theefficiency would be significantly lower due to the low intensity of thediffracted beam. The use of a diffraction grating only would beconceivable, admittedly.

The use of the polarized light, however, not only leads to a higherlight yield and hence higher efficiency of the correction light device,but also, due to the better absorption of p polarized radiation by theoptical element to be irradiated, the overall output of the light sourcecan be reduced.

FIGS. 6 to 9 show other exemplary embodiments of a correction lightdevice in which, however, instead of two-dimensional imaging of acorrection light pattern by a multi-mirror array, a scanning orrastering device is provided by which the correction light beam can beguided over the surface of the optical element to be irradiated, withvariation of the correction light as a function of the location of thecorrection light beam on the surface to be irradiated enabling thecorrection light to also be varied in location and time. In this way,here too, correction, for example, of differential heating of theoptical element due to inhomogeneous irradiation with imaging light ofthe optical arrangement can be compensated. Such a correction device,too, can project light at a very flat angle laterally into an opticalarrangement and onto the surface of an optical element, although, due tothe flat angle of incidence and the movement of the light beam over thesurface, allowance is desirably made for a change in the projected sizeof the correction light beam on the surface of the optical element dueto the numerical aperture of the correction light beam.

FIG. 6 shows a first exemplary embodiment of a corresponding correctionlight device in which a CO₂ laser functions as a correction light source20. The correction light 1 of the CO₂ laser 20 is guided through anacoustic-optic modulator (AOM) 21 which serves as the switching and/orcontrol element for the correction light 1. Through correspondingcontrol of the AOM 21, the correction light properties, such asintensity, light output and the like can be varied, such that ultimatelyirradiation of the optical element 6 at the respective point ofincidence of the correction light beam 1 can be set.

In the exemplary embodiment shown in FIG. 6, the correction light beam 1is deflected by a mirror element 22, and directed onto a first scanningdevice 23 in the form of a mirror, which rotates about an axis such thatthe correction light beam 1 is deflected at different angles, such thatthe correction light beam 1 is moved along a line across the opticalelement 6.

The correction light beam 1 is deflected via a further mirror 24 to adisplaceable mirror 25, and finally lands on the surface 9 of theoptical element 6. Via the displaceable mirror 25, the correction lightbeam 1, in accordance with the position of the mirror 25, will strikedifferent locations on the surface 9 of the optical element 6. Due tothe translational movement of the mirror 25, the correcting beam 1 canthus be moved along a second line, which is aligned perpendicularly tothe first line of the first scanning device 23, such that thedisplaceable mirror 25 constitutes a second scanning device. The mirror24 can be a focusing concave mirror which serves to produce a light spoton the surface 9. The mirror can generally be a diffractive orrefractive element with collecting action that focuses the light ontothe object. The focussing element is arranged at a focal length distancefrom the scanning device 23, such that all light bundles are parallel inobject space and thus no changes of angle occur at the object (see FIG.7).

In this regard, the correction light beam 1 is moved faster along thefirst scanning direction or line by the first scanning device 23 than bythe second scanning device 25 perpendicular thereto. In this way, thesurface 9 of the optical element 6 can be rasterized (scanned) line byline in order that each point on the surface 9 of the optical element 6can be covered. Optionally, the translational movement of the mirror 25can proceed incrementally, such that every time the first scanningdirection has been performed, the second scanning device 25 is shiftedby one increment in order that the second line on the surface 9 of theoptical element 6 may be performed, etc. However, an oscillatingmovement of the displaceable mirror element 25 in the form of asinusoidal or cosinusoidal vibration can occur, too, for example, at afrequency of 50 Hz. The speed of a simple mirror array of the kind shownin FIG. 6 can, for example, amount to 360,000 revolutions per minute fora frequency of 6 kHz.

Instead of a simple mirror arrangement, a polygon mirror arrangement canalso be used in which several mirror surfaces are arranged together inthe form of a polygon, such that, when the polygon mirror array isrotated, the individual mirror surfaces successively deflect thecorrection light beam 1. This allows the rotational speed to be reducedto a value of 15,000 revolutions per minute, equivalent to a frequencyof 250 Hz, for example, when the number of mirror surfaces is 24. Anumber of mirror surfaces in the range 24 to 32 mirrors is advantageous.The mirror material can, for example, be magnesium or ZERODUR (trademarkof Schott AG).

FIG. 7 shows in a detailed view the mode of operation of the firstscanning device in cooperation with the deflecting mirror 24.

Instead of a deflecting mirror 24, such as that presented in theexemplary embodiment of FIGS. 6 and 7, other optical elements, too, suchas lenses, mirrors, diffractive or refractive optical elements can beprovided in the correction light beam path, especially between a firstscanning device and a second scanning device 25 in order that optimalirradiation of the surface 9 of the optical element 6 may be achieved.

In the example shown in FIG. 6, it is particularly advantageous that,due to the displaceable mirror 25, which forms the second scanningdevice 25, focus tracking is dispensable or quasi integrated, becausethe change in the distance of the point of incidence on the surface 9from the scanning device is compensated by the displacement of themirror 25. Moreover, due to the displacement of the mirror 25, thecorrection light beam 1, at least in the one scanning direction, alwaysstrikes the surface 9 of the optical element 6 at the same angle, suchthat the size of the incident light beam 1 changes not on account ofdifferent angle of incidence as a function of point of incidence.Correspondingly, an additional focus tracking can be dispensed with.

The movement of the mirror 25 can be realised, as with the other movedparts, in any suitable way by corresponding electromotive drives and thelike.

FIGS. 8 and 9 show in two diagrams rotated at 90° to each other acorrection light device in which, again, components identical with thosein the exemplary embodiment of FIG. 6 bear the same reference symbols.Only those components which differ relative to the exemplary embodimentof FIG. 6 will therefore be described in detail in the following.

The correction light device of FIGS. 8 and 9 differs from that of FIG. 6especially in that, instead of one irradiated surface of an opticalelement 9, two surfaces 9 and 10 of two optical elements 6 and 8 can beirradiated simultaneously by a correction light source 20.

In addition, the correction light device of FIGS. 8 and 9 has a focustracking 27, which ensures that the size of the incident correctionlight is the same, irrespective of the point of incidence of thecorrection light beam.

In the correction light device of FIGS. 8 and 9, the infrared light 1,which is generated in the CO₂ laser 20, is guided via the acoustic-opticmodulator 21 to the focus tracking system 27, with the latter consistingof two optical lenses 31 and 32, of which one optical lens 31 isarranged so as to be displaceable along the optical axis.

Thereafter the correction light beam 1 is directed via the mirrorelement 22 onto a polygon scanner 26 with a plurality of polygonallyarranged mirror surfaces, which scanner rotates about an axis parallelto the mirror planes, such that the correction light beam 1 can be movedin a first scanning direction along a line. The correction light beam 1then strikes a collecting lens 28, which guides the correction lightbeam onto the second scanning device consisting of two Fresnel prisms orbi-prisms 29 and 30. The collecting lens is arranged at the focal lengthdistance from the scanner 26, such that the beam bundle exiting thecollecting lens 28 is parallel. Via the first Fresnel prism 29, theparallel correction light beam 1 is split into two separate light beams1 and 11, which are directed by the second Fresnel prism 30 onto thesurfaces 9 and 10 of the optical elements 6 and 8. Through displacementof the Fresnel prism 29 along the optical axis, the point of incidenceof the correction light beams 1 and 11 on surfaces 9 and 10 of theoptical elements 6 and 8 can be changed in a second scanning directionperpendicular to the first scanning direction. Similarly, through thisarrangement, too, all regions of the surfaces 9 and 10 of the opticalelements 6 and 8 can be covered with consistently large correction lightbeams 1 and 11. Through the chosen arrangement, it is possible here,too, to irradiate all regions of two surfaces of optical elements withcorrection light of constant beam size from the side at a very shallowangle.

It is furthermore possible to divide the acoustic-optic modulator 21 inFIG. 9 into upper and lower areas which can be actuated independently.As can be seen from the beam path, the portion of the correction lightbundle passing through the lower area of the acoustic-optic modulatorilluminates the surface 9 and the portion of the correction light bundlepassing through the upper area illuminates the surface 10. Thus,different irradiation intensity is adjustable.

Through corresponding choice of a suitable focal length of the opticalcorrection light arrangement 28, 29, 30 or the lens 28, the correctionlight device can be provided relatively far away from the optical axisof the optical elements 6 or 8 to be irradiated, with especially anarrangement outside the lens housing being possible.

FIG. 10 shows an optical arrangement in which a correction light devicescan find application. By way of example of correction, possible opticalelements 6 are labelled, with the arrows identifying additional regionsof the optical arrangement in which a correction light device could beprovided. Since the correction light devices, despite the very shallowirradiation angle of the correction light onto the optical elements tobe irradiated or corrected, involve a certain free height forirradiating with the correction light, candidate regions of an opticalarrangement are especially those in which the optical elements areprovided at a certain distance from each other. The correction lightdevices can in this regard be provided for the most part outside thelens housing.

FIG. 11 shows a chart of the complex relationships between thedependence of the size of the light spot, generated on the opticalelement to be corrected, on the angle of incidence and the numericalaperture (NA). Due to the environment of the optical element to becorrected, there is a maximum angle of incidence, which is determinedespecially by the distance between the optical element to be correctedand neighbouring elements, and its lateral extension, i.e. the areadimension of the surface to be corrected. This means, however, that theoptimum angle of incidence for the medial beam of a light bundle and thenumerical aperture of the beam in the plane of incidence of the lightbeam is largely predetermined. However, the numerical aperturetransverse to that can be optimized, such that the use of an anamorphiclight bundle can be advantageous. The optimization of the numericalaperture transverse to the plane of incidence can take place with a viewto improving efficiency of illumination or mixing of the illumination.For example, when a multi-mirror array is used, the numerical aperturecan be increased, such that a smaller dot image is produced. This can beadvantageous, however, because an area is imaged by the multi-mirrorarray. In the exemplary embodiment of the correction light device with ascanning device, changing the numerical aperture enables the dimensionsof the light spot to be adjusted, for example, to the mirror elements tobe moved, such that, in particular, the dimensions of mirror elements tobe moved quickly can be kept small.

The diagram shows a correction light bundle with the maximum angle ofincidence 200, the medial (central) beam 201 and the medial (central)angle of incidence 204 and the dependence of the light spotcross-sections in the focus area on the angle of incidence and thenumerical aperture NA. Apart from the medial (central) beam 201, thebeam is described by the so-called Gaussian-edge beam(Gauss-Rand-Strahl) 202 (solid line=1/e³ intensity level) and thegeometric edge beam 203 (dashed lines). From the 1/e³ beam waist w0 as afunction of distance z from the beam waist, the 1/e³ beam width computesto

${w( {z,{w\; 0}} )}:={1.5\sqrt{( {w\; 0} )^{2}( {1 + ( \frac{\lambda \cdot z}{{\pi \cdot w}\; 0^{2}} )^{2}} )}}$where${{NA}( {w\; 0} )}:=\frac{1.83}{2( {2w\; 0} )}$

As is apparent from the diagram, the light spot grows larger withincreasingly flat angle of incidence and distance from the focus area.With increase in NA, the beam waist becomes smaller, to be sure, but thebeam cross-section increases faster with increase in distance from thefocus.

For example, at a maximum angle of incidence of 10° and a wavelength of10.9 μm, the optimal angle of incidence of the medial beam is 9° and theoptimum numerical aperture is 0.017, yielding a minimum light spot sizeof approximately 5.5 mm.

Although the disclosure using the attached drawings has been describedin detail in relation to exemplary embodiments, it will be clear to aperson skilled in the art that modifications and changes are possiblesuch that different individual characteristics may be combined orindividual characteristics omitted, without surrender of the scope ofprotection of the enclosed characteristics.

1. (canceled)
 2. A projection exposure system for microlithography,comprising: an exposure light source to provide exposure light; aprojection objective comprising a plurality of optical elements arrangedalong an optical axis, the optical elements being configured to directthe exposure light from a mask in an object plane of the projectionobjective to a substrate in an image field of the projection objectiveduring operation of the projection exposure system for microlithography,the exposure light irradiating a first part of a surface of a firstoptical element of the plurality of optical elements; and a device forheating at least the first optical element, the device comprising: acorrection light source different from the exposure light source; and anoptical arrangement configured to direct correction light from thecorrection light source to an optical element of the projectionobjective such that at least a second part of the surface of the firstoptical element is irradiated with the correction light, the second partof the surface being different from the first part of the surface,wherein the correction light strikes the second part of the surface atan angle such that an obtuse angle between the optical axis of theprojection objective at the location of the first optical element andthe correction light is less than or equal to 105°.
 3. The projectionexposure system of claim 2, wherein the optical arrangement isconfigured to direct the correction light to irradiate the surface ofthe first optical element in a locally variable fashion to reduceunevenness in heating of the first optical element by the exposurelight.
 4. The projection exposure system of claim 3, wherein theunevenness in heating of the first optical element by the exposure lightis caused by non-uniform illumination of the surface of the firstoptical element by the exposure light.
 5. The projection exposure systemof claim 4, wherein the non-uniform irradiation is due tonon-rotationally symmetrical illumination of the projection exposuresystem.
 6. The projection exposure system of claim 4, wherein thenon-uniform irradiation is due to the image field having a slit-shape.7. The projection exposure system of claim 2, wherein the opticalarrangement comprises a mirror arrangement configured to direct thecorrection light from the correction light source to the first opticalelement of the projection objective.
 8. The projection exposure systemof claim 7, wherein the mirror arrangement is configured to direct thecorrection light from the correction light source to the optical elementof the projection objective is irradiated with the correction light in alocally variable fashion and/or temporally variable fashion.
 9. Theprojection exposure system of claim 7, wherein the mirror arrangementcomprises a plurality of mirror elements each arranged to direct lightto a different region of the surface of the first optical element. 10.The projection exposure system of claim 9, wherein each of the mirrorelements is switchable between a first state in which the mirror directscorrection light toward the surface and a second state in which themirror does not direct light to the surface.
 11. The projection exposuresystem of claim 10, wherein the plurality of mirror elements areswitchable between the first and second states separate from each other.12. The projection exposure system of claim 9, wherein the devicecomprises one or more additional elements positioned to direct thecorrection light from the mirror arrangement to the surface of theoptical element.
 13. The projection exposure system of claim 7, whereinthe mirror elements are arranged side by side.
 14. The projectionexposure system of claim 7, wherein the mirror arrangement comprises amulti-mirror array (MMA).
 15. The projection exposure system of claim 7,wherein the mirror arrangement comprises a polygonal mirror array. 16.The projection exposure system of claim 7, wherein the device furthercomprises a grating, and wherein the grating is between the correctionlight source and the mirror arrangement or between the mirrorarrangement and the first optical element.
 17. The projection exposuresystem of claim 2, wherein the correction light reduces thermalinhomogeneities of the first optical element caused by the exposurelight.
 18. The projection exposure system of claim 2, wherein thecorrection light beam is configured to heat the first optical elementfor a period of time in which the first optical element is unevenlyheated by the exposure light.
 19. The projection exposure system ofclaim 2, wherein the correction light source is a laser.
 20. Theprojection exposure system of claim 2, wherein the laser is a CO₂ laser.21. The projection exposure system of claim 2, wherein the correctionlight has a wavelength greater than or equal to 4 μm.
 22. The projectionexposure system of claim 2, wherein the projection objective comprises acurved mirror.
 23. The projection exposure system of claim 22, whereinthe projection objective comprises a plane mirror.
 24. The projectionexposure system of claim 2, wherein the device is further arranged todirect correction light to a different surface of the first opticalelement or to a surface of a second optical element of the plurality ofoptical elements of the projection objective.